The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

May. 30, 2013
Applicant:

Dmo Systems Limited, Hsinchu county, TW;

Inventors:

Jason Zse-Cherng Lin, Saratoga, CA (US);

Shauh-Teh Juang, Saratoga, CA (US);

Assignee:

DMO SYSTEMS LIMITED, Hsinchu County, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20016 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A number of wafers of a same semiconductor device are inspected to generate a plurality of candidate defect lists for identifying systematic defects. Each candidate defect list comprises a plurality of candidate defects obtained from inspecting one of the wafers. Each candidate defect is represented by a plurality of defect attributes including a defect location. The candidate defects in every one or more candidate defect lists are processed as a set by stage one grouping and filtering to generate a stage one defect list for each set. The candidate defects in all the stage one defect lists are then processed together by stage two grouping and filtering to generate a final defect lists for systematic defects. The defect attributes of each defect and a design pattern clip extracted from a design database based on the defect location are used in the hierarchical grouping and filtering.


Find Patent Forward Citations

Lin, Jason Zse-Cherng. (2015). System and method for identifying systematic defects in wafer inspection using hierarchical grouping and filtering (U.S. Patent No. 9142014). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9142014

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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