The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Jul. 31, 2013
Applicant:

Hoya Corporation, Tokyo, JP;

Inventors:

Osamu Nozawa, Tokyo, JP;

Hiroaki Shishido, Tokyo, JP;

Toshiyuki Suzuki, Tokyo, JP;

Assignee:

HOYA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/80 (2012.01); G03F 1/54 (2012.01); G03F 1/58 (2012.01);
U.S. Cl.
CPC ...
G03F 1/80 (2013.01); G03F 1/54 (2013.01); G03F 1/58 (2013.01);
Abstract

In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film. The highly oxidized layer is placed on a side opposite to a transparent substrate side.


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