The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Jan. 27, 2012
Applicants:

Manjusha Mehendale, Morristown, NJ (US);

Michael Kotelyanskii, Chatham, NJ (US);

Priya Mukundhan, Lake Hopatcong, NJ (US);

Michael Colgan, Flanders, NJ (US);

Wei Zhou, Minnetonka, MN (US);

Inventors:

Manjusha Mehendale, Morristown, NJ (US);

Michael Kotelyanskii, Chatham, NJ (US);

Priya Mukundhan, Lake Hopatcong, NJ (US);

Michael Colgan, Flanders, NJ (US);

Wei Zhou, Minnetonka, MN (US);

Assignee:

Rudolph Technologies, Inc., Flanders, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01J 1/04 (2006.01); G01N 21/55 (2014.01); G01N 21/47 (2006.01); G01N 21/17 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01J 1/0448 (2013.01); G01N 21/47 (2013.01); G01N 21/55 (2013.01); G01N 21/1702 (2013.01); G01N 21/9501 (2013.01);
Abstract

An automatically adjustable method for use in opto-acoustic metrology or other types of metrology operations is described. The method includes modifying the operation of a metrology system that uses a PSD style sensor arrangement. The method may be used to quickly adjust the operation of a metrology system to ensure that the data obtained therefrom are of the desired quality. Further, the method is useful in searching for and optimizing data that is or can be correlated to substrate or sample features or characteristics that of interest. Apparatus and computer readable media are also described.


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