The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2015
Filed:
Dec. 06, 2010
Jeffrey Alan Hawkins, Portland, OR (US);
Charles Lorenzo Merrill, Portland, OR (US);
Jason Daniel Marchetti, Tualatin, OR (US);
Kousik Ganesan, Tualatin, OR (US);
Bryan L. Buckalew, Tualatin, OR (US);
Jeffrey Alan Hawkins, Portland, OR (US);
Charles Lorenzo Merrill, Portland, OR (US);
Jason Daniel Marchetti, Tualatin, OR (US);
Kousik Ganesan, Tualatin, OR (US);
Bryan L. Buckalew, Tualatin, OR (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
An apparatus for conditioning deionized water and delivering it to a semiconductor wafer in a post electrofill module includes a degassing station configured to remove dissolved gas from the deionized water flow, a heating station configured to heat the deionized water flow, and a nozzle configured to deliver the deionized water flow to the wafer. The heating and degassing are performed before the delivery of the deionized water flow to the wafer. In some implementations the degassing station includes a contact degasser or an inert gas bubbler, and the heating station is configured to heating the deionized water flow to a temperature of between about 35-40° C. In some embodiments the deionized water flow is passed through the degassing station before being passed through the heating station.