The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2015
Filed:
Nov. 11, 2014
Toyo Advanced Technologies Co., Ltd., Hiroshima-shi, JP;
Hiroki Nikawa, Hiroshima, JP;
Seichiyou Makihira, Hiroshima, JP;
Yuichi Mine, Hiroshima, JP;
Yoshinori Abe, Hiroshima, JP;
Tatsuyuki Nakatani, Hiroshima, JP;
Keishi Okamoto, Hiroshima, JP;
Yuki Nitta, Hiroshima, JP;
TOYO ADVANCED TECHNOLOGIES CO., LTD., Hiroshima-Shi, JP;
Abstract
A method for manufacturing an implant material includes preparing a base material for implant, removing moisture from a chamber in which the base material is placed, and introducing material gas as a carbon source and a silicon source into the chamber after the removal of the moisture to form a carbon thin film containing a C—C component in which carbon atoms are bonded, and a SiC component in which carbon and silicon atoms are bonded on a surface of the base material by ionized deposition.