The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Apr. 11, 2008
Applicant:

Dave Pratt, Meridian, ID (US);

Inventor:

Dave Pratt, Meridian, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 25/00 (2006.01); H01L 23/48 (2006.01); H01L 23/00 (2006.01); H01L 25/065 (2006.01);
U.S. Cl.
CPC ...
H01L 25/50 (2013.01); H01L 23/481 (2013.01); H01L 24/12 (2013.01); H01L 24/81 (2013.01); H01L 25/0657 (2013.01); H01L 2224/10135 (2013.01); H01L 2224/10165 (2013.01); H01L 2224/13009 (2013.01); H01L 2224/13099 (2013.01); H01L 2224/13147 (2013.01); H01L 2224/8014 (2013.01); H01L 2224/8114 (2013.01); H01L 2224/81136 (2013.01); H01L 2224/81139 (2013.01); H01L 2224/81141 (2013.01); H01L 2224/81801 (2013.01); H01L 2225/06513 (2013.01); H01L 2225/06541 (2013.01); H01L 2924/014 (2013.01); H01L 2924/0105 (2013.01); H01L 2924/01029 (2013.01); H01L 2924/01033 (2013.01); H01L 2924/01046 (2013.01); H01L 2924/01047 (2013.01); H01L 2924/01049 (2013.01); H01L 2924/01074 (2013.01); H01L 2924/01075 (2013.01); H01L 2924/01078 (2013.01); H01L 2924/01079 (2013.01); H01L 2924/14 (2013.01); Y10T 29/49117 (2015.01);
Abstract

A method is provided for forming a die stack. The method includes forming a plurality of through-wafer vias and a first plurality of alignment features in a first die. A second plurality of alignment features is formed in a second die, and the first die is stacked on the second die such that the first plurality of alignment features engage the second plurality of alignment features. A method of manufacturing a die stack is also provided that includes forming a plurality of through-wafer vias on a first die, forming a plurality of recesses on a first die, and forming a plurality of protrusions on a second die. A die stack and a system are also provided.


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