The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
May. 11, 2012
Yoba Amoah, Fairfax, VT (US);
John J. Ellis-monaghan, Grand Isle, VT (US);
Roger C. Kuo, South Burlington, VT (US);
Molly J. Leitch, Nashville, TN (US);
Zhihong Zhang, Chandler, AZ (US);
Yoba Amoah, Fairfax, VT (US);
John J. Ellis-Monaghan, Grand Isle, VT (US);
Roger C. Kuo, South Burlington, VT (US);
Molly J. Leitch, Nashville, TN (US);
Zhihong Zhang, Chandler, AZ (US);
GLOBALFOUNDRIES, Inc., Grand Cayman, KY;
Abstract
Various embodiments disclosed include methods of performing a double exposure process on a level of an integrated circuit (IC) chip to form an IC chip having an embedded electrically measurable identifier. In some cases, the method includes: exposing a level of an integrated circuit (IC) chip using a first mask orientation; subsequently exposing the level of the IC chip using a second mask orientation distinct from the first mask orientation; and developing the level of the IC chip to form an electrically measurable identifier on the IC chip.