The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Feb. 18, 2013
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventor:

Zhigang Wang, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); H01J 37/26 (2006.01); H01J 37/22 (2006.01); G06K 9/32 (2006.01); G06K 9/62 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/265 (2013.01); G06K 9/3216 (2013.01); G06K 9/6202 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2809 (2013.01); H01J 2237/2817 (2013.01);
Abstract

The present invention aims at providing a pattern dimension measuring device that realizes the measurement of a dimension of a pattern difficult to set up a measurement box, or between patterns away from each other with high precision. In order to achieve the above object, a pattern dimension measuring device is proposed which moves a field of view with reference to a first pattern formed on the specimen on the basis of predetermined first distance information, acquires a first image, executes template matching with the use of the first image and a matching template, and calculates a distance between a second pattern included in the first image and the first pattern on the basis of second distance information obtained by the template matching, and the first distance information.


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