The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Oct. 24, 2013
Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Shin-ya Nakafuji, Tokyo, JP;

Shin-ya Minegishi, Tokyo, JP;

Takanori Nakano, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); C08G 8/20 (2006.01); B44C 1/22 (2006.01); C08G 61/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); B44C 1/227 (2013.01); C08G 8/20 (2013.01); C08G 61/02 (2013.01); G03F 7/094 (2013.01); G03F 7/30 (2013.01); G03F 7/36 (2013.01); C08G 2261/314 (2013.01); C08G 2261/332 (2013.01); C08G 2261/90 (2013.01);
Abstract

A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. Rrepresents a hydroxy group, or the like. n is an integer of 0 to 5. X represents a divalent hydrocarbon group having 1 to 20 carbon atoms or an alkanediyloxy group having 1 to 20 carbon atoms. m is an integer of 1 to 7. A sum of m and n is no greater than 7. Rrepresents a single bond or an alkanediyl group having 1 to 4 carbon atoms. Rrepresents an alicyclic group having 4 to 20 carbon atoms or an aryl group having 6 to 30 carbon atoms. A part or all of hydrogen atoms included in the alicyclic group or the aryl group represented by Rare unsubstituted or substituted.


Find Patent Forward Citations

Loading…