The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Sep. 20, 2006
Applicants:

Jérôme Daviot, Leuven, BE;

José Gonzalez, Paris, FR;

Inventors:

Jérôme Daviot, Leuven, BE;

José Gonzalez, Paris, FR;

Assignee:

ALCHIMER, Massy, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 3/38 (2006.01); C25D 5/54 (2006.01); C25D 5/34 (2006.01); H01L 21/288 (2006.01); H01L 21/768 (2006.01); C25D 7/12 (2006.01);
U.S. Cl.
CPC ...
C25D 5/54 (2013.01); C25D 3/38 (2013.01); C25D 5/34 (2013.01); C25D 7/123 (2013.01); H01L 21/2885 (2013.01); H01L 21/76873 (2013.01);
Abstract

The object of the present invention is an electroplating composition intended in particular for coating a copper-diffusion barrier layer with a seed layer, This composition comprises a source of copper ions, in a concentration of between 0.4 and 40mM; at least one copper complexing agent chosen from the group of primary aliphatic amines, secondary aliphatic amines, tertiary aliphatic amines, aromatic amines, nitrogen heterocycles and oximes; the copper/complexing agent(s) molar ratio being between 0.1 and 2.5, preferably between 0.3 and 1.3; and the pH of the composition being less than 7, preferably between 3.5 and 6.5.


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