The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
May. 21, 2013
Nissan Chemical Industries, Ltd., Tokyo, JP;
Hiroaki Sakaida, Sodegaura, JP;
Eiichirou Ishimizu, Sodegaura, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
An object is to provide a polishing liquid composition that can provide hydrophilicity to a wafer surface and effectively improve a haze in polishing of wafers for substrates in electronics industry. The present invention is a polishing liquid composition for wafers, comprising: water; silica particles; an alkaline compound; a polyvinyl alcohol; an anion-modified polyvinyl alcohol; and a surfactant, wherein the mass ratio of the anion-modified polyvinyl alcohol to the polyvinyl alcohol is 0.6 to 5.5. The anion-modified polyvinyl alcohol is preferably a polyvinyl alcohol modified with a carboxy group or a sulfonic acid group.