The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Dec. 18, 2012
Institut National D'optique, Québec, CA;
Michel Doucet, Saint-Augustin-de-Desmaures, CA;
Michel Robert, Québec, CA;
Daniel Lefebvre, Québec, CA;
INSTITUT NATIONAL D'OPTIQUE, Québec, Quebec, CA;
Abstract
A method for determining a centerline for a triangulation-based optical profilometry system, compensating for the spatial variations of the reflectance of an object's surface. The method comprises providing a luminous line on the object, the luminous line being a triangulation line superposed with a compensation line; capturing an image of the triangulation line and of the compensation line; for each position along the imaged triangulation line, determining a transverse triangulation profile from the imaged triangulation line and a transverse compensation profile from the imaged compensation line; determining a transverse correction profile given by the reciprocal of the transverse compensation profile; multiplying the transverse triangulation profile with the transverse correction profile to obtain a corrected transverse triangulation profile; computing a center of the corrected transverse triangulation profile. The centers determined at positions along the triangulation line form the centerline. Embodiments of a triangulation-based optical profilometry system integrating the method are disclosed.