The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Dec. 12, 2008
Ron Rulkens, Milpitas, CA (US);
Nanhai LI, Pleasanton, CA (US);
Artur Kolics, Dublin, CA (US);
Aman Jain, Cupertino, CA (US);
Darin Birtwhistle, San Francisco, CA (US);
Chee Chan, Cupertino, CA (US);
Ron Rulkens, Milpitas, CA (US);
Nanhai Li, Pleasanton, CA (US);
Artur Kolics, Dublin, CA (US);
Aman Jain, Cupertino, CA (US);
Darin Birtwhistle, San Francisco, CA (US);
Chee Chan, Cupertino, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plating system comprises a plating solution and an apparatus for control of the plating solution, the apparatus including a Raman spectrometer for measurement of organic components, a visible light spectrometer for measurement of metallic components, and a pH probe. The plating solution can be sampled continuously or at intervals. Dosing of the plating solution adjusts for components consumed or lost in the plating process. The method of dosing is based on maintaining a desired composition of the plating solution.