The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Aug. 06, 2013
Cymer, Llc, San Diego, CA (US);
Matthew Graham, San Diego, CA (US);
Robert Bergstedt, Carlsbad, CA (US);
Steven Chang, San Diego, CA (US);
Cymer, LLC, San Diego, CA (US);
Abstract
Extreme ultraviolet light (EUV) is produced in a laser-produced plasma (LPP) EUV light source when laser light strikes a target. Measuring reflected light from the target by a Return Beam Diagnostics (RBD) module provides data on EUV production, including but not limited to target position, target focus, target shape, and target profile. In a RBD module, a controller sequences an optical switch to direct the reflected light between a blocking element and a sensing device, providing greater flexibility in measuring the reflected light during different aspects of the EUV generation process, such as different power levels and duty cycles of the laser light striking the target.