The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

Dec. 05, 2007
Applicants:

Shoichi Takamizawa, Annaka, JP;

Masataka Watanabe, Annaka, JP;

Inventors:

Shoichi Takamizawa, Annaka, JP;

Masataka Watanabe, Annaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 29/40 (2006.01); C23C 16/448 (2006.01); C30B 25/02 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C30B 29/406 (2013.01); C23C 16/4488 (2013.01); C30B 25/02 (2013.01); C30B 29/403 (2013.01); H01L 21/02005 (2013.01); H01L 21/02008 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01);
Abstract

The present invention provides a method for manufacturing a nitride semiconductor self-supporting substrate and a nitride semiconductor self-supporting substrate manufactured by this manufacturing method, the method including at least: a step of preparing a nitride semiconductor self-supporting substrate serving as a seed substrate; a step of epitaxially growing the same type of nitride semiconductor as the seed substrate on the seed substrate; and a step of slicing an epitaxially grown substrate subjected to the epitaxial growth into two pieces in parallel to an epitaxial growth surface. As a result, there is provided a method for manufacturing a large-diameter nitride semiconductor self-supporting substrate having an excellent crystal quality and small warp with good productivity at a low cost, etc.


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