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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9127113 B1

PDFFull Text
Expired
Date of Patent:
Sep. 08, 2015

Filed:

May. 16, 2012

Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same

Applicants:

Phillip Dene Hustad, Manvel, TX (US);

Peter Trefonas, Iii, Medway, MA (US);

Frank Steven Bates, Saint Louis Park, MN (US);

Marc Andrew Hillmyer, Minneapolis, MN (US);

Justin Glenn Kennemur, Minneapolis, MN (US);

Inventors:

Phillip Dene Hustad, Manvel, TX (US);

Peter Trefonas, III, Medway, MA (US);

Frank Steven Bates, Saint Louis Park, MN (US);

Marc Andrew Hillmyer, Minneapolis, MN (US);

Justin Glenn Kennemur, Minneapolis, MN (US);

Assignees:

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);

UNIVERSITY OF MINNESOTA, Minneapolis, MN (US);

Attorney:

Cantor Colburn LLP

Primary Examiner:

Jeffrey Mullis

Int. Cl.
CPC ...
C08L 53/00 (2006.01); C08F 299/04 (2006.01); C08F 297/02 (2006.01);
U.S. Cl.
CPC ...
C08F 299/04 (2013.01); C08F 297/026 (2013.01);
Abstract

Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; and a second block derived from an acrylate monomer; where a chi parameter that measures interactions between the first block and the second block is greater than or equal to about 0.05, when measured at 240° C. Disclosed herein too is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing an acrylate monomer; and where the block copolymer has a chi parameter of greater than or equal to about 0.05, when measured at 240° C.; where the chi parameter is a measure of interactions between the first block and the second block.

Find Patent Forward Citations

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Hustad, Phillip. (2015). Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same (U.S. Patent No. 9127113). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9127113

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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