The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Mar. 20, 2013
Applicant:

Mapper Lithography Ip B.v., Delft, NL;

Inventors:

Pieter Kruit, Delft, NL;

Marc Smits, Pijnacker, NL;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/02 (2006.01); H01J 37/317 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); F15D 1/02 (2006.01); H01J 9/38 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); F15D 1/025 (2013.01); G03F 7/70925 (2013.01); H01J 9/38 (2013.01); H01J 37/3177 (2013.01); G21K 2201/06 (2013.01); H01J 37/32862 (2013.01); H01J 2237/006 (2013.01); H01J 2237/022 (2013.01); H01J 2237/3173 (2013.01); H01J 2237/327 (2013.01); Y10T 137/2082 (2015.04); Y10T 137/87571 (2015.04);
Abstract

The invention relates to an arrangement for transporting radicals. The arrangement includes a plasma generator and a guiding body. The plasma generator includes a chamber () in which a plasma may be formed. The chamber has an inlet () for receiving an input gas, and one or more outlets () for removal of at least one of the plasma and radicals created therein. The guiding body is hollow and is arranged for guiding radicals formed in the plasma towards an area or volume at which contaminant deposition is to be removed. The chamber inlet is coupled to a pressure device () for providing a pulsed pressure into the chamber so as to create a flow in the guiding body.


Find Patent Forward Citations

Loading…