The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Mar. 31, 2012
Applicants:

Tom Miller, Portland, OR (US);

Sean Kellogg, Portland, OR (US);

Jiri Zbranek, Hillsboro, OR (US);

Inventors:

Tom Miller, Portland, OR (US);

Sean Kellogg, Portland, OR (US);

Jiri Zbranek, Hillsboro, OR (US);

Assignee:

FEI COMPANY, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/302 (2006.01); H01J 37/24 (2006.01); H01J 37/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 37/045 (2013.01); H01J 37/243 (2013.01); H01J 37/302 (2013.01); H01J 2237/043 (2013.01); H01J 2237/0805 (2013.01); H01J 2237/0817 (2013.01); H01J 2237/30472 (2013.01); H01J 2237/31749 (2013.01);
Abstract

An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.


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