The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Oct. 29, 2007
Applicants:

Vinay Gupta, Tampa, FL (US);

Ashok Kumar, Tampa, FL (US);

Cecil Coutinho, Tampa, FL (US);

Subrahmanya Mudhivarthi, Tampa, FL (US);

Inventors:

Vinay Gupta, Tampa, FL (US);

Ashok Kumar, Tampa, FL (US);

Cecil Coutinho, Tampa, FL (US);

Subrahmanya Mudhivarthi, Tampa, FL (US);

Assignee:

University of South Florida, Tampa, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 21/31053 (2013.01);
Abstract

Organic-inorganic composites were prepared as colloidal particles of a cross-linked, thermally responsive polymer. Hybrid PNIPAM-polysiloxane particles and composite polymeric particles with embedded nanoparticles of an inorganic metal-oxide (MO) such as CeO2 and TiO2 were formed. To promote the incorporation of unaggregated nanoparticles, temperature responsive microspherical gels (microgels) of N-isopropylacrylamide (NIPAM) with interpenetrating (IP) linear chains of poly(acrylic acid) (PAA) were used. The organic-inorganic composition of the hybrid polymer network was controlled by changing the time for condensation and hydrolysis of the siloxane monomer during synthesis. Experimental results indicated that the planarization of silicon oxide wafers using these hybrid particles and composites exhibited lower topographical variations and surface roughness as compared to slurries consisting of only silica or ceria nanoparticles while achieving similar removal rates and better or similar frictional characteristics.


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