The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2015

Filed:

Dec. 27, 2013
Applicant:

Shin-etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo, JP;

Inventors:

Masayoshi Sagehashi, Joetsu, JP;

Koji Hasegawa, Joetsu, JP;

Takeshi Sasami, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 69/013 (2006.01); C07C 69/653 (2006.01); G03F 7/004 (2006.01); C07D 317/34 (2006.01); C07D 317/72 (2006.01); C08F 220/22 (2006.01); C08F 220/24 (2006.01); C08F 220/18 (2006.01); C08F 222/18 (2006.01); C08F 222/20 (2006.01); C08F 222/22 (2006.01); C08F 220/28 (2006.01); G03F 7/039 (2006.01); C08F 24/00 (2006.01);
U.S. Cl.
CPC ...
C07C 69/013 (2013.01); C07C 69/653 (2013.01); C07D 317/34 (2013.01); C07D 317/72 (2013.01); C08F 24/00 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/28 (2013.01); C08F 222/18 (2013.01); C08F 222/20 (2013.01); C08F 222/22 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); Y10S 430/108 (2013.01); Y10S 430/111 (2013.01);
Abstract

A fluorinated monomer has formula (1) wherein Ris H, F, methyl or trifluoromethyl, Rand Rare H or a monovalent hydrocarbon group, Rto Reach are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and kis 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.


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