The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2015

Filed:

Jun. 08, 2012
Applicants:

Hyung Sun Kim, Seoul, KR;

Dong Wha Park, Seoul, KR;

Sung Hwan Cho, Jecheon Si, KR;

Sun IL Kim, Cheonan Si, KR;

Won Kyung Lee, Incheon, KR;

Hyun Jin Shim, Goyang Si, KR;

Inventors:

Hyung Sun Kim, Seoul, KR;

Dong Wha Park, Seoul, KR;

Sung Hwan Cho, Jecheon Si, KR;

Sun Il Kim, Cheonan Si, KR;

Won Kyung Lee, Incheon, KR;

Hyun Jin Shim, Goyang Si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 19/14 (2006.01); C03C 3/145 (2006.01); C03C 12/00 (2006.01); C03B 19/10 (2006.01); C01G 29/00 (2006.01);
U.S. Cl.
CPC ...
C03B 19/14 (2013.01); C01G 29/00 (2013.01); C03B 19/1025 (2013.01); C03B 19/1407 (2013.01); C03C 3/145 (2013.01); C03C 12/00 (2013.01); C01P 2004/64 (2013.01); C03B 2201/62 (2013.01);
Abstract

Disclosed is a method for manufacturing a low melting point nano glass powder. The method includes the steps of: preparing a bismuth-based low melting point glass powder precursor of a micro size, having bismuth (Bi) as the main ingredient; injecting the glass powder precursor into a reaction chamber of a plasma treatment device; applying thermal plasma via a direct current power source to the glass powder precursor injected into the reaction chamber, to vaporize the glass powder precursor; and generating nano glass powder having a nano size by quenching the gas generated by vaporizing the glass powder precursor.


Find Patent Forward Citations

Loading…