The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Feb. 07, 2012
Applicants:
Fangxing Wei, Folsom, CA (US);
Subratakumar Mandal, Portland, OR (US);
Inventors:
Fangxing Wei, Folsom, CA (US);
Subratakumar Mandal, Portland, OR (US);
Assignee:
INTEL CORPORATION, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03K 3/03 (2006.01); H04L 7/00 (2006.01); H03K 5/13 (2014.01); H03K 5/00 (2006.01);
U.S. Cl.
CPC ...
H04L 7/0087 (2013.01); H03K 5/133 (2013.01); H03K 3/0315 (2013.01); H03K 2005/00052 (2013.01);
Abstract
A novel digital eye width monitor (DEWM) system and method are disclosed. The DEWM system provides on-die capability to directly measure the left and right eye-width in picoseconds. The DEWM system measures the time from the phase interpolator (PI) clock position (data eye center, left edge, right edge) to a reference clock, and calculates the left and right eye width within a single-digit pico-second level of accuracy.