The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Jun. 27, 2005
Mitsunori Takeshita, Toyama, JP;
Tomoyuki Matsuda, Toyama, JP;
Mitsuhiro Hirano, Toyama, JP;
Akihiro Sato, Toyama, JP;
Shinya Morita, Toyama, JP;
Toshimitsu Miyata, Toyama, JP;
Koji Shibata, Toyama, JP;
Mitsunori Takeshita, Toyama, JP;
Tomoyuki Matsuda, Toyama, JP;
Mitsuhiro Hirano, Toyama, JP;
Akihiro Sato, Toyama, JP;
Shinya Morita, Toyama, JP;
Toshimitsu Miyata, Toyama, JP;
Koji Shibata, Toyama, JP;
HITACHI KOKUSAI ELECTRIC INC., Tokyo, JP;
Abstract
The sizes required for maintenance are reduced and an occupying floor area is reduced. The substrate processing apparatus contains a load lock chamberand a transfer chamberrespectively provided in order from the rear side within a case; and a processing chamberprovided above the load lock chamberfor processing wafers. An opening sectionA, and an opening and closing meansA for opening and closing the opening sectionA are respectively provided in a location at the rear side of the transfer chamberwhere the load lock chamberis not arranged.