The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Sep. 04, 2014
Applicant:
Mapper Lithography Ip B.v., Delft, NL;
Inventors:
Sohail Chatoor, Delft, NL;
Joost Witteveen, Delft, NL;
Alon Rosenthal, Delft, NL;
Johan Joost Koning, Delft, NL;
Assignee:
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/08 (2006.01); H01J 37/147 (2006.01); G21K 1/093 (2006.01); G21K 1/087 (2006.01); H01J 37/317 (2006.01); H01F 7/06 (2006.01);
U.S. Cl.
CPC ...
G21K 1/093 (2013.01); G21K 1/087 (2013.01); H01J 37/1475 (2013.01); H01J 37/3177 (2013.01); H01F 2007/068 (2013.01);
Abstract
The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: