The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Mar. 08, 2012
Applicants:
Jan Werschnik, Jena, DE;
Markus Augustin, Jena, DE;
Lutz Reichmann, Jena, DE;
Inventors:
Assignee:
JENOPTIK Optical Systems GmbH, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 26/08 (2006.01); G02B 3/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70208 (2013.01); G02B 3/0056 (2013.01); G02B 26/0841 (2013.01); G03F 7/7005 (2013.01); G03F 7/70291 (2013.01); H01L 21/67069 (2013.01);
Abstract
The invention relates to an exposure device () for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.