The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Feb. 10, 2014
Applicants:

Yongdong Zhou, Oak Ridge, TN (US);

Xiao Zhou, Oak Ridge, TN (US);

Jianhua Wan, Oak Ridge, TN (US);

Inventors:

Yongdong Zhou, Oak Ridge, TN (US);

Xiao Zhou, Oak Ridge, TN (US);

Jianhua Wan, Oak Ridge, TN (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 31/0352 (2006.01); H01L 31/028 (2006.01); H01L 31/0224 (2006.01); H01L 31/117 (2006.01); H01L 31/118 (2006.01);
U.S. Cl.
CPC ...
H01L 31/035281 (2013.01); H01L 31/028 (2013.01); H01L 31/022408 (2013.01); H01L 31/117 (2013.01); H01L 31/118 (2013.01);
Abstract

A High Purity Germanium (HPGe) radiation detector has been specially machined to be this invented series multi-chamber coaxial configuration. So extra-large volume HPGe detectors can be easily produced with current available HPGe crystal, and the entire detector body structure can be uniquely optimized in accordance with the exact semiconductor crystal ingot situation so the overall detector can be easier depleted and the photo-induced carriers can be better collected as the signal output. This invention makes extra-large efficiency HPGe gamma ray detectors of 100% to 200%, and maybe even higher efficiency, possible and easier to be produced based on current HPGe crystal supply capability. The invention improves the detector performance for very high energy gamma ray detection especially. The invention could also be applied to any other kind of semiconductor materials if any of them could be purified enough for this application in future.


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