The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Jan. 28, 2013
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Yasushi Ebizuka, Tokyo, JP;

Seiichiro Kanno, Tokyo, JP;

Makoto Nishihara, Tokyo, JP;

Masashi Fujita, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01); H01J 37/22 (2006.01); H02N 13/00 (2006.01); H01J 37/28 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/226 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H02N 13/00 (2013.01); H01J 2237/06 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/2801 (2013.01);
Abstract

An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism () in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source () to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.


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