The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Jul. 28, 2011
Lorenz Lechner, Ulm, DE;
Ute Kaiser, Ulm, DE;
Johannes Biskupek, Ulm, DE;
Carl Zeiss Microscopy GmbH, , DE;
Abstract
A process for manufacturing a TEM-lamella includes mounting () a plate shaped substrate having a thickness in a support, manufacturing () a first, strip-shaped recess on a first side of the substrate under a first angle to the support by means of a particle beam, and manufacturing () a second strip-shaped recess on a second side of the substrate under a second angle to the support by means of a particle beam, such that the first and the second strip-shaped recess mutually form an acute or right angle, and between them form an overlap region of lesser thickness. The lamella has a thicker rim region and a thinner central region, with a first strip-shaped, recess on a first side of the lamella and a second strip-shaped recess on a second side of the lamella, wherein the first and the second strip-shaped recess mutually form an acute or right angle, and between them form an overlap region having a thickness of below 100 nm. An apparatus for executing the process or manufacturing the lamella includes a lamella support pivotable about a transverse axis and a longitudinal axis inclined, to the vertical direction, a device for rotating about the longitudinal axis, and stop means for limiting a tilt of the lamella support about the transverse axis.