The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
May. 03, 2012
Vishal Sipani, Boise, ID (US);
David A. Kewley, Boise, ID (US);
Kyle Armstrong, Meridian, ID (US);
Michael Dean Van Patten, Fruitland, ID (US);
Michael D. Hyatt, Boise, ID (US);
Vishal Sipani, Boise, ID (US);
David A. Kewley, Boise, ID (US);
Kyle Armstrong, Meridian, ID (US);
Michael Dean Van Patten, Fruitland, ID (US);
Michael D. Hyatt, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Substrates and methods of forming a pattern on a substrate. The pattern includes a repeating pattern region and a pattern-interrupting region adjacent to the repeating pattern region. A mask is formed on the substrate, with the mask including the repeating pattern region and the pattern-interrupting region and which are formed using two separate masking steps. The mask is used in forming the pattern into underlying substrate material on which the mask is received. Substrates comprising masks are also disclosed.