The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Apr. 25, 2014
Applicant:

Intermolecular, Inc., San Jose, CA (US);

Inventors:

Zhi-Wen Sun, Sunnyvale, CA (US);

Nikhil Kalyankar, Mountain View, CA (US);

Nitin Kumar, Fremont, CA (US);

Minh Anh Nguyen, San Jose, CA (US);

Sagar Vijay, Fremont, CA (US);

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/02 (2006.01); H01L 31/0236 (2006.01); C23F 1/16 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02366 (2013.01); C23F 1/16 (2013.01); H01L 31/0236 (2013.01); H01L 31/02363 (2013.01); Y02E 10/50 (2013.01);
Abstract

The present disclosure includes a texture formulation that includes an aliphatic diol, an alkaline compound and water which provides a consistent textured region across a silicon surface suitable for solar cell applications. The current invention describes silicon texturing formulations that include at least one high boiling point additive. The high boiling point additive may be a derivative compound of propylene glycol or a derivative compound of ethylene glycol. Processes for texturing a crystalline silicon substrate using these formulations are also described. Additionally, a combinatorial method of optimizing the textured surface of a crystalline silicon substrate is described.


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