The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2015
Filed:
Mar. 13, 2014
Carl Zeiss Microscopy Gmbh, Jena, DE;
Matthias Vaupel, Goettingen, DE;
Helmut Lippert, Jena, DE;
Carl Zeiss Microscopy GmbH, Jena, DE;
Abstract
A method for determining roughness data and/or topography data of surfaces in material microscopy, particularly from flat samples, based on a shearing polarization interferometrical sequence with a microscopic 'TIC' module ('Total Interference Contrast Module') of a microscope, wherein the method can be carried out both polychromatically and monochromatically. At least two tilted wave fronts are generated, which after reflection or transmission on a sample generate two images of said sample in the form of fringe patterns, said images being offset relative to one another and interfering with one another, from which roughness values and height topographies of the surface of the sample are determined by application of image evaluation.