The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Dec. 29, 2011
Applicants:

Sang-hak Lim, Uiwang-si, KR;

Bong-hwan Kim, Uiwang-si, KR;

Jung-kang OH, Uiwang-si, KR;

Taek-soo Kwak, Uiwang-si, KR;

Jin-hee Bae, Uiwang-si, KR;

Hui-chan Yun, Uiwang-si, KR;

Dong-il Han, Uiwang-si, KR;

Sang-kyun Kim, Uiwang-si, KR;

Jin-wook Lee, Uiwang-si, KR;

Inventors:

Sang-Hak Lim, Uiwang-si, KR;

Bong-Hwan Kim, Uiwang-si, KR;

Jung-Kang Oh, Uiwang-si, KR;

Taek-Soo Kwak, Uiwang-si, KR;

Jin-Hee Bae, Uiwang-si, KR;

Hui-Chan Yun, Uiwang-si, KR;

Dong-Il Han, Uiwang-si, KR;

Sang-Kyun Kim, Uiwang-si, KR;

Jin-Wook Lee, Uiwang-si, KR;

Assignee:

CHEIL INDUSTRIES, INC., Gumi-si, Kyeongsangbuk-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01); C08G 77/54 (2006.01); H01L 21/02 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
C08G 77/54 (2013.01); H01L 21/02164 (2013.01); H01L 21/02216 (2013.01); H01L 21/02222 (2013.01); H01L 21/02282 (2013.01); H01L 28/40 (2013.01);
Abstract

A composition for forming silica-based insulation layer includes a hydrogenated polysiloxazane including a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2, and having a chlorine concentration of about 1 ppm or less:


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