The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

May. 10, 2012
Applicants:

Kota Funayama, Kanagawa, JP;

Hiraku Chakihara, Kanagawa, JP;

Yasushi Ishii, Kanagawa, JP;

Inventors:

Kota Funayama, Kanagawa, JP;

Hiraku Chakihara, Kanagawa, JP;

Yasushi Ishii, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/94 (2006.01); H01L 27/115 (2006.01); H01L 27/105 (2006.01); H01L 21/28 (2006.01); H01L 49/02 (2006.01); H01L 29/423 (2006.01); H01L 29/792 (2006.01); G11C 16/04 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11565 (2013.01); G11C 16/0466 (2013.01); H01L 21/28282 (2013.01); H01L 27/1052 (2013.01); H01L 27/11568 (2013.01); H01L 28/40 (2013.01); H01L 29/4234 (2013.01); H01L 29/66833 (2013.01); H01L 29/792 (2013.01); H01L 29/66477 (2013.01);
Abstract

A memory cell of a nonvolatile memory and a capacitive element are formed over the same semiconductor substrate. The memory cell includes a control gate electrode formed over the semiconductor substrate via a first insulating film, a memory gate electrode formed adjacent to the control gate electrode over the semiconductor substrate via a second insulating film, and the second insulating film having therein a charge storing portion. The capacitive element includes a lower electrode formed of the same layer of a silicon film as the control gate electrode, a capacity insulating film formed of the same insulating film as the second insulating film, and an upper electrode formed of the same layer of a silicon film as the memory gate electrode. The concentration of impurities of the upper electrode is higher than that of the memory gate electrode.


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