The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Jan. 16, 2012
Applicants:
Steven Randolph, Portland, OR (US);
Clive D. Chandler, Portland, OR (US);
Inventors:
Steven Randolph, Portland, OR (US);
Clive D. Chandler, Portland, OR (US);
Assignee:
FEI COMPANY, Hillsboro, OR (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); C23C 16/48 (2006.01); C23C 16/04 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C23C 16/486 (2013.01); C23C 16/047 (2013.01); C23C 16/34 (2013.01); C23C 16/407 (2013.01); H01L 21/76892 (2013.01); H01J 2237/31732 (2013.01);
Abstract
An improved method of beam deposition to deposit a low-resistivity metal. Preferred embodiments of the present invention use a novel focused ion beam induced deposition precursor to deposit low-resistivity metallic material such as tin. Applicants have discovered that by using a methylated or ethylated metal such as hexamethylditin as a precursor, material can be deposited having a resistivity as low as 40 μΩ·cm.