The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Oct. 25, 2011
Applicants:
Stephan Hoffmann, Finkenstein, DE;
Harald Kraus, Villach, AT;
Gunter Mettin, Villach, AT;
Inventors:
Assignee:
LAM RESEARCH AG, Villach, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/00 (2006.01); C11D 7/06 (2006.01); C23G 3/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); C11D 11/00 (2006.01); C23G 1/14 (2006.01); C11D 7/32 (2006.01);
U.S. Cl.
CPC ...
C11D 7/06 (2013.01); C11D 7/3209 (2013.01); C11D 11/0047 (2013.01); C23G 1/14 (2013.01); C23G 3/00 (2013.01); H01L 21/02057 (2013.01); H01L 21/67051 (2013.01);
Abstract
In a method and apparatus for treating a surface of an article, an improved rinse liquid prevents build-up of static charge while avoiding damages to certain types of exposed metal-containing surfaces. In one embodiment, a semiconductor wafer having structures including at least one of cobalt, nickel and platinum is rotated on a spin chuck, as a rinse liquid is dispensed onto a surface of the wafer. The rinse liquid is a dilute aqueous solution of a base of the formula