The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2015

Filed:

Sep. 02, 2014
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Anthony Graupera, Hillsboro, OR (US);

Charles Otis, Hillsboro, OR (US);

Assignee:

FEI COMPANY, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/16 (2006.01); H01J 27/02 (2006.01); H01J 37/05 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/05 (2013.01); H01J 37/08 (2013.01); H01J 2237/049 (2013.01); H01J 2237/057 (2013.01); H01J 2237/08 (2013.01); H01J 2237/303 (2013.01);
Abstract

An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.


Find Patent Forward Citations

Graupera, Anthony. (2015). Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions (U.S. Patent No. 9087671). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9087671

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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