The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
Sep. 19, 2011
Applicants:
Hans-juergen Rostalski, Oberkochen, DE;
Tilman Schwertner, Aalen, DE;
Alexander Epple, Aalen, DE;
Inventors:
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03B 27/52 (2006.01); G03B 27/60 (2006.01); G03B 27/70 (2006.01); G02B 17/06 (2006.01); G02B 7/182 (2006.01); G03F 7/20 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
G02B 17/0663 (2013.01); G02B 7/182 (2013.01); G02B 17/061 (2013.01); G03F 7/70233 (2013.01);
Abstract
The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.