The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2015

Filed:

Aug. 14, 2013
Applicant:

Electronics and Telecommunications Research Institute, Daejeon, KR;

Inventors:

Yong Suk Yang, Daejeon, KR;

In-Kyu You, Daejeon, KR;

Soon-Won Jung, Daejeon, KR;

Bock Soon Na, Daejeon, KR;

Seok-Hwan Moon, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/15 (2006.01); B41J 2/14 (2006.01); B41J 2/16 (2006.01); B41J 2/06 (2006.01);
U.S. Cl.
CPC ...
B41J 2/14 (2013.01); B41J 2/06 (2013.01); B41J 2/16 (2013.01); B41J 2/1621 (2013.01); B41J 2/1629 (2013.01); B41J 2/1631 (2013.01); B41J 2/1639 (2013.01); B41J 2/1642 (2013.01); B41J 2/1646 (2013.01); B41J 2202/04 (2013.01);
Abstract

Provided are a large-area nano-scale active printing device, a fabricating method of the same, and a printing method using the same. The printing device may include a substrate, first interconnection lines extending along a first direction, on the substrate, an interlayered dielectric layer provided on the first interconnection lines to have holes partially exposing the first interconnection lines, second interconnection lines provided adjacent to the holes in the interlayered dielectric layer to cross the first interconnection lines, and wedge-shaped electrodes provided at intersections with the first and second interconnection lines and connected to the first interconnection lines. The wedge-shaped electrodes protrude upward at centers of the holes.


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