The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Oct. 18, 2011
Bernd Bickel, Zurich, CH;
Peter Kaufmann, Liebefeld, CH;
Bernhard Thomaszewski, Zurich, CH;
Derek Edward Bradley, Zurich, CH;
Philip John Jackson, Glendale, CA (US);
Stephen R. Marschner, Ithaca, NY (US);
Wojciech Matusik, Lexington, MA (US);
Markus Gross, Uster, CH;
Thabo Dominik Beeler, Savognin, CH;
Bernd Bickel, Zurich, CH;
Peter Kaufmann, Liebefeld, CH;
Bernhard Thomaszewski, Zurich, CH;
Derek Edward Bradley, Zurich, CH;
Philip John Jackson, Glendale, CA (US);
Stephen R. Marschner, Ithaca, NY (US);
Wojciech Matusik, Lexington, MA (US);
Markus Gross, Uster, CH;
Thabo Dominik Beeler, Savognin, CH;
DISNEY ENTERPRISES, INC., Burbank, CA (US);
ETH ZURICH (EIDGENOESSISCHE TECHNISCHE HOCHSCHULE ZURICH), Zurich, CH;
Abstract
A computer-implemented method is provided for physical face cloning to generate a synthetic skin. Rather than attempt to reproduce the mechanical properties of biological tissue, an output-oriented approach is utilized that models the synthetic skin as an elastic material with isotropic and homogeneous properties (e.g., silicone rubber). The method includes capturing a plurality of expressive poses from a human subject and generating a computational model based on one or more material parameters of a material. In one embodiment, the computational model is a compressible neo-Hookean material model configured to simulate deformation behavior of the synthetic skin. The method further includes optimizing a shape geometry of the synthetic skin based on the computational model and the captured expressive poses. An optimization process is provided that varies the thickness of the synthetic skin based on a minimization of an elastic energy with respect to rest state positions of the synthetic skin.