The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Dec. 22, 2011
Tomoki Matsuda, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
Yoko Tokugawa, Shizuoka, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Mitsuhiro Fujita, Shizuoka, JP;
Tomoki Matsuda, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
Yoko Tokugawa, Shizuoka, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Mitsuhiro Fujita, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.