The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2015

Filed:

May. 18, 2012
Applicants:

Tetsuji Ohsawa, Tokyo, JP;

Naoya Ishigaki, Tokyo, JP;

Inventors:

Tetsuji Ohsawa, Tokyo, JP;

Naoya Ishigaki, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H02N 13/00 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H02N 13/00 (2013.01); H01L 21/6831 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/248 (2013.01);
Abstract

To improve an apparatus reliability by applying a voltage suitable to a situation, a charged-particle-beam apparatusof the present invention includes: a sample stage; an electrostatic chuck; and an electrostatic-chuck controlling unit, and generates an image of a sampleby irradiating the sampleheld on the sample stageby the electrostatic chuckwith an electron beam. The electrostatic-chuck controlling unit, when the electrostatic chuckholds the sample, applies a preset initial voltage to a chuck electrode of the electrostatic chuck; determines whether or not the sampleis normally clamped to the electrostatic chuck; and increases the voltage applied to the chuck electrode until determining that the sampleis clamped normally to the electrostatic chuckif determining that the sampleis not clamped normally to the electrostatic chuck


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