The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2015

Filed:

Jan. 26, 2010
Applicants:

Tianniu Chen, Rocky Hill, CT (US);

Steven Bilodeau, Oxford, CT (US);

Karl E. Boggs, Hopewell Junction, NY (US);

Ping Jiang, Danbury, CT (US);

Michael B. Korzenski, Danbury, CT (US);

George Mirth, Saratoga, CA (US);

Kim Y. Van Berkel, Mountain View, CA (US);

Inventors:

Tianniu Chen, Rocky Hill, CT (US);

Steven Bilodeau, Oxford, CT (US);

Karl E. Boggs, Hopewell Junction, NY (US);

Ping Jiang, Danbury, CT (US);

Michael B. Korzenski, Danbury, CT (US);

George Mirth, Saratoga, CA (US);

Kim Y. Van Berkel, Mountain View, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C11D 11/00 (2006.01); C11D 1/66 (2006.01); C11D 3/43 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0041 (2013.01); C11D 1/66 (2013.01); C11D 3/43 (2013.01); C11D 11/0047 (2013.01);
Abstract

Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus.


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