The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2015

Filed:

Mar. 12, 2014
Applicant:

Himax Imaging, Inc., Grand Cayman, KY;

Inventors:

Yang Wu, Grand Cayman, KY;

Feixia Yu, Grand Cayman, KY;

Inna Patrick, Grand Cayman, KY;

Yu Hin Desmond Cheung, Grand Cayman, KY;

Assignee:

Himax Imaging, Inc., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 31/113 (2006.01); H01L 31/18 (2006.01); H01L 31/0352 (2006.01);
U.S. Cl.
CPC ...
H01L 31/0352 (2013.01); H01L 31/18 (2013.01); H01L 27/14654 (2013.01); H01L 27/14689 (2013.01); H01L 31/1136 (2013.01);
Abstract

The present invention provides an image sensor and a fabricating method of the image sensor. The image sensor comprises: a first type epitaxial layer, a photodiode region, a first type well region, a gate region of a source follower transistor, and a first type implant isolation region. The first type well region is formed within the first type epitaxial layer with a first horizontal distance to the photodiode region and a vertical distance to a surface of the first type epitaxial layer. The gate region of a source follower transistor is formed on the surface of the first type epitaxial layer and above the first type well region, and has a second horizontal distance to the photodiode region. There is a distance between the first type implant isolation region and the first type well region as an anti-blooming path.


Find Patent Forward Citations

Loading…