The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
Jan. 20, 2015
Joseph M. Jacobson, Newton, MA (US);
David Kong, Lexington, MA (US);
Vikas Anant, Cambridge, MA (US);
Ashley Salomon, Chicago, IL (US);
Saul Griffith, Cambridge, MA (US);
Will Delhagen, Cambridge, MA (US);
Vikrant Agnihotri, Cambridge, MA (US);
Joseph M. Jacobson, Newton, MA (US);
David Kong, Lexington, MA (US);
Vikas Anant, Cambridge, MA (US);
Ashley Salomon, Chicago, IL (US);
Saul Griffith, Cambridge, MA (US);
Will DelHagen, Cambridge, MA (US);
Vikrant Agnihotri, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.