The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
Sep. 13, 2011
Martin L. Yarmush, Newton, MA (US);
Erkin Seker, Davis, CA (US);
Yevgeny Berdichevsky, Bethlehem, PA (US);
Martin L. Yarmush, Newton, MA (US);
Erkin Seker, Davis, CA (US);
Yevgeny Berdichevsky, Bethlehem, PA (US);
THE GENERAL HOSPITAL CORPORATION, Boston, MA (US);
Abstract
A method is disclosed for fabricating a low-impedance nanoporous metal multiple electrode array for measuring electrophysiology activity. A patterned photoresist is applied to a substrate, in which the patterned photoresist corresponds to a pattern of the nanoporous metal multiple electrode array. A metal alloy including a sacrificial alloying element is deposited in the pattern of the nanoporous metal electrode array. The patterned photoresist is removed to expose the metal alloy as deposited. At least part of the sacrificial alloying element is removed from the metal alloy to create nanoporous metal electrode tips thereby forming the nanoporous metal multiple electrode array. The resultant nanoporous metal multiple electrode array has improved impedance characteristics in comparison to conventional multiple electrode arrays.