The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2015

Filed:

Apr. 19, 2012
Applicants:

Shigeo Tokumitsu, Kanagawa, JP;

Akio Uenishi, Kanagawa, JP;

Inventors:

Shigeo Tokumitsu, Kanagawa, JP;

Akio Uenishi, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 21/38 (2006.01); H01L 29/78 (2006.01); H01L 27/02 (2006.01); H01L 21/8234 (2006.01); H01L 21/8238 (2006.01); H01L 29/66 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); H01L 21/823418 (2013.01); H01L 21/823456 (2013.01); H01L 21/823475 (2013.01); H01L 21/823493 (2013.01); H01L 21/823814 (2013.01); H01L 21/82385 (2013.01); H01L 21/823871 (2013.01); H01L 21/823892 (2013.01); H01L 29/41758 (2013.01); H01L 29/42364 (2013.01); H01L 29/4238 (2013.01); H01L 29/66689 (2013.01); H01L 29/7816 (2013.01); H01L 29/7833 (2013.01); H01L 29/7835 (2013.01); H01L 29/7836 (2013.01); H01L 29/0692 (2013.01); H01L 29/0847 (2013.01); H01L 29/1033 (2013.01); H01L 29/1083 (2013.01); H01L 29/1087 (2013.01); H01L 29/1095 (2013.01); H01L 29/66568 (2013.01); H01L 29/66575 (2013.01);
Abstract

The high voltage transistor includes a first impurity layer, a second impurity layer formed inside the first impurity layer, so as to put the second impurity layer between them, a pair of third impurity layers and fourth impurity layers formed inside the first impurity layer, a fifth impurity layer formed from the uppermost surface of the first impurity layer to the inside of the first impurity layer so as to protrude along the main surface in the direction where the second impurity layer is disposed, and a conductive layer formed above the uppermost surface of the second impurity layer. The concentration of the impurity in the fourth impurity layer is higher than the concentration of the impurity in the third and the fifth impurity layers, and the concentration of the impurity in the fifth impurity layer is higher than the concentration of the impurity in the third impurity layer.


Find Patent Forward Citations

Tokumitsu, Shigeo. (2015). Semiconductor device and manufacturing method thereof (U.S. Patent No. 9064689). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9064689

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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