The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Jul. 16, 2013
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Dow Global Technologies Llc, Midland, MI (US);
Matthias S. Ober, Midland, MI (US);
Vipul Jain, Westborough, MA (US);
John B. Etienne, Mount Pleasant, MI (US);
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);
Abstract
A photoresist composition includes a polymer with repeat units having the structure wherein each occurrence of Rand Ris independently hydrogen, unsubstituted or substituted Clinear or branched alkyl, unsubstituted or substituted Ccycloalkyl, unsubstituted or substituted Caryl, or unsubstituted or substituted Cheteroaryl; and Rand Rare optionally covalently linked to each other to form a ring that includes —R—C—R—; each occurrence of Ar, Ar, and Aris independently an unsubstituted or substituted Carylene, or unsubstituted or substituted Cheteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.