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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9063416 B1

PDFFull Text
Date of Patent:
Jun. 23, 2015

Filed:

Dec. 06, 2012

Resist composition, method of forming resist pattern and compound

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Yoshitaka Komuro, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Toshiaki Hato, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Cynthia H Kelly

Assistant Examiner:

Alyssa L Cepluch

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 59/125 (2006.01); G03F 7/027 (2006.01); G03F 7/039 (2006.01); C07D 313/10 (2006.01); C07D 327/04 (2006.01); C07D 333/46 (2006.01); C07D 333/54 (2006.01); C07D 333/76 (2006.01); C07D 335/02 (2006.01); C07D 335/16 (2006.01); C07C 323/52 (2006.01); C07C 381/12 (2006.01); C07D 493/18 (2006.01); C07D 307/00 (2006.01); C07D 307/33 (2006.01); C07C 25/18 (2006.01); C07C 69/14 (2006.01); C07C 69/63 (2006.01); C07C 69/753 (2006.01); C07C 69/78 (2006.01); C07C 59/13 (2006.01); C07C 59/66 (2006.01); C07C 59/70 (2006.01); C07C 62/04 (2006.01); C07D 493/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); C07D 313/10 (2013.01); C07D 327/04 (2013.01); C07D 333/46 (2013.01); C07D 333/54 (2013.01); C07D 333/76 (2013.01); C07D 335/02 (2013.01); C07D 335/16 (2013.01); C07C 323/52 (2013.01); C07C 381/12 (2013.01); C07D 493/18 (2013.01); C07D 307/00 (2013.01); C07D 307/33 (2013.01); C07C 25/18 (2013.01); C07C 2101/08 (2013.01); C07C 2103/74 (2013.01); C07C 69/14 (2013.01); C07C 69/63 (2013.01); C07C 69/753 (2013.01); C07C 69/78 (2013.01); C07C 59/125 (2013.01); C07C 59/13 (2013.01); C07C 59/66 (2013.01); C07C 59/70 (2013.01); C07C 62/04 (2013.01); C07D 493/08 (2013.01);
Abstract

A resist composition comprising: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid-generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound represented by general formula (c1) shown below. In the formula, Rrepresents a hydrogen atom or a hydrocarbon group of 1 to 20 carbon atoms which may have a substituent; each of Rand Rindependently represents a hydrogen atom or a hydrocarbon group of 1 to 20 carbon atoms which may have a substituent; at least two of Rto Rmay be mutually bonded to form a ring; X represents an oxygen atom or a sulfur atom; n represents 0 or 1; and Zrepresents an organic cation.

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