The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2015

Filed:

Feb. 15, 2012
Applicants:

Shigenori Fujikawa, Wako, JP;

Harumi Hayakawa, Wako, JP;

Takahiro Senzaki, Kawasaki, JP;

Ken Miyagi, Kawasaki, JP;

Inventors:

Shigenori Fujikawa, Wako, JP;

Harumi Hayakawa, Wako, JP;

Takahiro Senzaki, Kawasaki, JP;

Ken Miyagi, Kawasaki, JP;

Assignees:

Riken, Wako-shi, JP;

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); H05K 3/00 (2006.01); B81C 1/00 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
H05K 3/00 (2013.01); B81C 1/00031 (2013.01); B81C 2201/0149 (2013.01); H01L 21/0271 (2013.01); H01L 21/0272 (2013.01); H01L 21/31133 (2013.01); G03F 7/168 (2013.01); G03F 7/325 (2013.01);
Abstract

A method for producing a substrate having a surface nanostructure, including a forming, on a substrate, a layer containing a block copolymer having a plurality of blocks bonded together, and subsequently heating this layer to cause phase separation of the layer; a decomposing at least a portion of the phase including at least one block of the plurality of blocks that constitute the block copolymer of this layer; and immersing the layer in a developing solution and selectively removing the phase containing the decomposed block(s), the developing solution containing, as the main component, an organic solvent having an SP value of 7.5 to 11.5 (cal/cm)and a vapor pressure at 25° C. that is less than 2.1 kPa, or benzene which may be substituted with an alkyl group, an alkoxy group or a halogen atom.


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Fujikawa, Shigenori. (2015). Method for producing substrate having surface nanostructure (U.S. Patent No. 9060415). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9060415

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