The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Jun. 17, 2013
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Geraud Jean-Michel Dubois, Los Altos, CA (US);
Theo J. Frot, Los Gatos, CA (US);
Teddie P. Magbitang, San Jose, CA (US);
Willi Volksen, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0226 (2013.01); H01L 21/02203 (2013.01);
Abstract
In some examples, a process to generate an in-situ hardmask layer on porous dielectric materials using the densifying action of a plasma in conjunction with a sacrificial polymeric filler, the latter which enables control of the hardmask thickness as well as a well-defined interface with the underlying ILD.